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Benitec granted first U.S. and U.K. patents for DNA directed gene silencing
Queensland | Thursday, June 5, 2003, 08:00 Hrs  [IST]

Benitec Ltd., the first company to demonstrate RNA interference (RNAi) in human cells, announced the grant of its core technology patents in the United States and the United Kingdom. These patents, with priority dating to 1998, describe a revolutionary method for silencing any gene in any cell using DNA directed RNA interference (ddRNAi). U.S. Patent 6,573,099 is entitled "Genetic constructs for delaying or repressing the expression of a target gene" and U.K. Patent 2353282 is entitled "Control of gene expression." Both patents contain world first claims that describe the effect of RNAi in human cells and the DNA constructs which trigger RNAi. The patents were jointly granted to Benitec and The State of Queensland, Australia and Benitec holds exclusive worldwide rights to both patents under a partnership agreement with The State of Queensland.

"These broad patents confirm Benitec as a pioneer in the effective application of RNAi to humans and the leader in ddRNAi technology," stated John McKinley, Chairman and Chief Executive Officer of Benitec, Ltd. "We will now leverage our dominant IP position to secure further commercialization opportunities, add to our licensing partners and expand our efforts to develop ddRNAi targets for drug development."

"RNAi is the simplest and most precise method of gene silencing and ddRNAi is the most versatile method of triggering RNAi in human cells," stated Ken Reed, Director of Research & Technology with Benitec. "In contrast to RNAi induction using double-stranded RNA, ddRNAi does not provoke the natural interferon response in cells. Critical to the biopharma industry, ddRNAi can also manipulate gene silencing for either transient or permanent effect, and can be used to reduce gene expression or silence it completely. It also has more versatility with respect to delivery vehicles, further increasing options for development of therapeutics. As a bonus, manufacturing costs are significantly less."

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